• Which Method Fits Your Application? 

Particle Characterisation Seminar Open Day (Principles & Best Practices of Particle Size and Shape Measurement) 

Laboratory Products

Which Method Fits Your Application? Particle Characterisation Seminar Open Day (Principles & Best Practices of Particle Size and Shape Measurement) 

Aug 29 2014

A free seminar open day with presentations and practical sessions is being held at Retsch Technology UK in Hope, Hope Valley, on Thursday, 2nd October 2014 between 9.30am – 4.30pm.

The seminar will be an overview of both Sieving and Dynamic Image Analysis by providing an interactive platform to raise the understanding of the characterisation of particles. A number of speakers from both Retsch Technology and industrial users are supporting the event. The day will close with an open forum discussion for any questions or problematic samples.

To reserve your place apply online www.retsch-techynology.com/seminaruk


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